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Spectral-angular ellipsometry in the light reflection mode for determining optical parameters (refractive index, absorption coefficient) and film thickness in multilayer systems and bulk materials.

Spectral-angular ellipsometry in the light reflection mode for determining optical parameters (refractive index, absorption coefficient) and film thickness in multilayer systems and bulk materials. PLACE ORDER

Service/Product Name:

Spectral-angular ellipsometry in the light reflection mode for determining optical parameters (refractive index, absorption coefficient) and film thickness in multilayer systems and bulk materials.

Brief Description of the Service/Product:

Measurement of spectral dependencies of ellipsometric parameters in the range λ = 245-2100 nm in the mode of external mirror light reflection and comprehensive characterization of layered structures using dielectric function modeling for components of multilayer structures (for each layer separately) with the use of various dispersion equations.
Physico-mathematical modeling of spectral dependence of optical parameters (n, k(λ) or ε(λ)) using approximation models such as Cauchy, Sellmeier, and others (in the transparency region), Lorentz, Gaussian, Tauc-Lorentz, Tanguy, Adachi, Drude, critical point models, and others (in the absorption region).
Establishing the relationship between the parameters of the dielectric function and the structure of the system/material or their changes under the influence of specific technological treatments.
Determination of the optical absorption edge of the material.
Investigation of lateral inhomogeneity of optical parameters in thin-film coatings.
Research objects: thin metallic, dielectric, and semiconductor films; organic layers and polymers; epitaxial films, thin-film solar cells, and other R&D materials; 2D and 3D nanostructures, and composite materials (provided that the characteristic size of inhomogeneities is much smaller than the wavelength).

Available Equipment and Personnel for Service Provision/Product Manufacturing:

  1. Spectral multi-angle ellipsometer with a rotating compensator SE-2000 (λ = 245-2100 nm, incident angle range 15°-90°, probe beam diameter on the sample surface 3 mm or 0.470×0.365 mm²).

  2. Personnel capacity: 2 senior research scientists.

Certification of Equipment and Instruments

Certificate from the manufacturer.

Availability of Intellectual Property Protection Documents and Their Validity

Absent.

Approximate Price of the Service/Product

Price: Negotiable

Problems Addressed by This Service/Product

Non-destructive, contactless optical characterization of optical and structural parameters of bulk materials, thin films (including nanostructured films), and multilayer heterostructures.

Potential Consumers of This Service/Product by Industries and Enterprises

Enterprises in the microelectronics, semiconductor, and optical industries, academic and industry institutes, higher education institutions, private organizations, and entrepreneurs interested in optical characterization of materials and systems.

Approximate Timeframes for Service/Product Completion

a) For Prototype Sample:
b) For Pilot Batch:
c) For Production Implementation:

Depending on the complexity of the object's structure and the depth of analysis, for a single sample or a batch of similar samples, from 15 minutes to several days.

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