Doping profiling with depth, elemental analysis of samples.

Service/Product Name:

Doping profiling with depth, elemental analysis of samples.

Brief Description of the Service/Product:

Determination of impurity distributions in multilayer, implanted, and thin-film conductive structures with depth using Secondary Ion Mass Spectrometry (SIMS) and Secondary Neutral Mass Spectrometry (SNMS). Elemental composition analysis on the surface of samples from hydrogen to uranium. SNMS quantitative analysis of the elemental composition of metallic samples to concentrations of 10¹⁸ cm⁻³.

Available Equipment and Personnel for Service Provision/Product Manufacturing:

1. Secondary Ion Microprobe ATOMIKA 4000 (Germany), Mass Spectrometer INA-3 (Germany)
2. 1 Senior Researcher

Certification of Equipment and Instruments

Certificate for determining the elemental composition.

Availability of Intellectual Property Protection Documents and Their Validity

Approximate Price of the Service/Product

Price: Negotiable

Problems Addressed by This Service/Product

Purity and isotopic composition of materials, quality of microelectronic structures, environmental issues.

Potential Consumers of This Service/Product by Industries and Enterprises

Enterprises producing microelectronic components, mining and beneficiation plants, physical and chemical institutes, mineral resources, environmental sector, medical metal implants.

Approximate Timeframes for Service/Product Completion

a) For Prototype Sample:
b) For Pilot Batch:
c) For Production Implementation:

a) Approximately 1 day.